look at this definitions Is it correct ?
Ion implantation and diffusion both process is used to add impurity into wafer surface
Diffusion is process by which atom of material are deposited on to the surface of wafer at high temperature
Movement of atom form source to wafer at high temperature
Ion implantation is process by which ion of material deposited on to wafer surface
Ion of material accelerate in electric field and deposited into wafer surface
Ion implantation and diffusion both process is used to add impurity into wafer surface
Diffusion is process by which atom of material are deposited on to the surface of wafer at high temperature
Movement of atom form source to wafer at high temperature
Ion implantation is process by which ion of material deposited on to wafer surface
Ion of material accelerate in electric field and deposited into wafer surface